| Autor: |
J. Malenfant, J. Hazelton, J.E. Sedgewick, A.J. Franceschelli |
| Rok vydání: |
2002 |
| Předmět: |
|
| Zdroj: |
Proceedings of 11th International Conference on Ion Implantation Technology. |
| DOI: |
10.1109/iit.1996.586413 |
| Popis: |
Statistical Process Control has had increasing popularity in the manufacturing environment in recent years. SPC is the process of collecting information that is indicative of the health of the equipment and or process. Analysis of the data can determine the normal operating parameters of a machine or process and deviations from the norm. Long term operating trends can also be detected. This data collection and analysis technique has proven extremely useful on a high current ion implanter in a semiconductor fabrication facility. The on-board Statistical Process Control option is available on the NV-GSD200 series implanter as well as the NV-GSD/HE implanter. The SPC package provides a user friendly method to look for process trends or machine parameter changes that would otherwise be difficult to monitor. This paper will discuss the fundamentals of the SPC package and its application in a semiconductor fabrication facility. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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