When the Sequence of Thin Film Deposition Matters: Examination of Organic-on-Organic Heterostructure Formation Using Molecular Beam Techniques and in Situ Real Time X-ray Synchrotron Radiation

Autor: Rambert K. Nahm, E. R. Kish, James R. Engstrom, Arthur R. Woll
Rok vydání: 2016
Předmět:
Zdroj: The Journal of Physical Chemistry C. 120:6165-6179
ISSN: 1932-7455
1932-7447
DOI: 10.1021/acs.jpcc.6b01717
Popis: We have examined the growth of bilayers and superlattices of pentacene and perylene derivatives (PTCDI-Cn) using in situ real time X-ray synchrotron radiation techniques and ex situ atomic force microscopy. We find that the growth of PTCDI-Cn layers on 1 monolayer (ML) of pentacene is initially 2D layer-by-layer (LbL), eventually transitioning to a mode of growth that is more 3D after several monolayers have been deposited. We find that the extent of 2D LbL growth depends on the length of the alkyl end chains, Cn: the smoothest films are formed with PTCDI-C5, while the roughest are formed with PTCDI-C13. These observations reflect a difference in the Ehrlich–Schwoebel barrier for step-edge crossing with alkyl end-chain length. When the sequence of deposition is reversed, we observe spectacular changes in the evolution of surface roughness for the growth of pentacene thin films on 1 ML of PTCDI-Cn. The growth is immediately 3D, while still remaining crystalline. The morphology of these thin films indicates...
Databáze: OpenAIRE