Possibilités d'obtention de dépôts dans le système céramique ti-v-c-n à partir de sources moléculaires

Autor:	Patrick Cassoux, C. Danjoy, Robert Choukroun, Lydie Valade, D. de Caro, Benoît Chansou
Rok vydání:	1998
Předmět:	Mineralogy chemistry.chemical_element Chemical vapor deposition Nitride Carbide Metal chemistry visual_art Atom Materials Chemistry visual_art.visual_art_medium Deposition (phase transition) Physical chemistry Thin film Titanium
Zdroj:	Annales de Chimie Science des Matériaux. 23:721-732
ISSN:	0151-9107
DOI:	10.1016/s0151-9107(99)80019-1
Popis:	Monometallic and heterobtmetallic titanium and vanadium compounds were prepared and studied as precursors to the chemical vapor deposition (CVD) of carbide and nitride ceramic thin films. Their thermal properties are discussed according to the chemical environment of the metal atom and their CVD behavior is studied. Two of them, CpTiCl 2 N(SiMe 3 ) 2 and Cp 2 VMe 2 , are applied to the deposition of thin films within the Ti-V-C-N quaternary system.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::1c45d35c8bd3868f588e01adc472a212 https://doi.org/10.1016/s0151-9107(99)80019-1 Zobrazit plný text záznamu