Nanohole formation in TEOS-HMDSO hybrid CVD films elucidated by positron beams
| Autor: | Nagayasu Oshima, B E O’Rourke, Kenji Ito, Atsushi Yabuuchi |
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| Rok vydání: | 2014 |
| Předmět: |
History
Hexamethyldisiloxane Materials science Annealing (metallurgy) Chemical vapor deposition Computer Science Applications Education Tetraethyl orthosilicate Condensed Matter::Materials Science chemistry.chemical_compound Surface coating Nuclear magnetic resonance Positron chemistry Chemical engineering Plasma-enhanced chemical vapor deposition Thin film |
| Zdroj: | Journal of Physics: Conference Series. 505:012022 |
| ISSN: | 1742-6596 1742-6588 |
| DOI: | 10.1088/1742-6596/505/1/012022 |
| Popis: | Silicon-oxide-backboned hybrid thin films with thicknesses around 600 nm were fabricated through plasma enhanced chemical vapor deposition from tetraethyl orthosilicate mixed with hexamethyldisiloxane as precursors, and their subnano-scaled holes, generated by annealing at 560 °C, were investigated by means of the positron lifetime technique with a pulsed, low-energy positron beam. The hole dimension was quantified from the ortho-positronium lifetime for the as-prepared and annealed films with different compositions. The effect of the heat treatment and the precursor composition on the subnano holes was discussed. |
| Databáze: | OpenAIRE |
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