| Autor: |
Milton L. Peabody, Donald M. Tennant, Maria Elina Simon, Nagesh R. Basavanhally, D.O. Lopez, Flavio Pardo, Jaesik Lee, J. S. Weiner, G. P. Watson, J.F. Miner, William M. Mansfield, R. Cirelli, Avinoam Kornblit, L. Fetter, Yee L. Low, Vladimir A. Aksyuk, Robert Francis Fullowan, C. A. Bolle, J.E. Bower, F. Klemens, A.R. Papazian, T.W. Sorsch |
| Rok vydání: |
2006 |
| Předmět: |
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| Zdroj: |
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 24:2852 |
| ISSN: |
1071-1023 |
| Popis: |
Spatial light modulators (SLMs) designed to replace photomasks for optical lithography have been designed, fabricated, and tested. These microelectromechanical devices are fabricated with alternating polycrystalline Si and sacrificial SiO2 layers that are patterned by a 193nm wavelength scanner to dimensions as small as 150nm. Aerial image simulations were used to define the mechanical requirements of the devices. Piston motion of electrically actuated devices was measured with an optical profilometer. The measurements were fit to a simple equation to within 1nm precision, which is adequate for defining 50nm features lithographically. Transient response measurements show that one version of the SLM responds to actuation as quickly as 20μs, fast enough for current 193nm wavelength excimer laser sources. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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