Effect of the substrate temperature on zirconium oxynitride thin films deposited by water vapour–nitrogen radiofrequency magnetron sputtering
| Autor: | A. Cappello, Leander Tapfer, Antonella Rizzo, M.A. Signore, Emanuela Piscopiello, L. Capodieci |
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| Rok vydání: | 2010 |
| Předmět: |
Zirconium
Materials science Metals and Alloys Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Zirconium nitride Atmospheric temperature range Sputter deposition Surfaces Coatings and Films Electronic Optical and Magnetic Materials Secondary ion mass spectrometry chemistry.chemical_compound chemistry Sputtering Physical vapor deposition Materials Chemistry Thin film |
| Zdroj: | Thin Solid Films. 518:1943-1946 |
| ISSN: | 0040-6090 |
| Popis: | ZrN x films were deposited by radiofrequency reactive magnetron sputtering technique in nitrogen and water vapour atmosphere varying the working temperature from room temperature to 600 °C. The films' physical properties were investigated using X-ray diffraction, Secondary Ion Mass Spectroscopy, Atomic Force Microscopy and Transmission Electron Microscopy. It was found that the increase of temperature caused a decrease in the oxygen incorporation and a transition from cubic phase of Zr 2 ON 2 to ZrN one. The formation of nanosized crystalline particles dispersed in the amorphous matrix was observed. |
| Databáze: | OpenAIRE |
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