Optical, compositional and structural properties of pulsed laser deposited nitrogen-doped Titanium-dioxide
| Autor: | Peter Heszler, Judit Budai, B. Farkas, Mikael Ottosson, Albert Oszkó, Zs. Geretovszky |
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| Rok vydání: | 2018 |
| Předmět: |
Materials science
Dopant Band gap Analytical chemistry General Physics and Astronomy 02 engineering and technology Surfaces and Interfaces General Chemistry Substrate (electronics) 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences 0104 chemical sciences Surfaces Coatings and Films Pulsed laser deposition law.invention X-ray photoelectron spectroscopy Ellipsometry law Thin film Crystallization 0210 nano-technology |
| Zdroj: | Applied Surface Science. 433:149-154 |
| ISSN: | 0169-4332 |
| Popis: | N-doped TiO2 thin films were prepared using pulsed laser deposition by ablating metallic Ti target with pulses of 248 nm wavelength, at 330 °C substrate temperature in reactive atmospheres of N2/O2 gas mixtures. These films were characterized by spectroscopic ellipsometry, X-ray photoelectron spectroscopy and X-ray diffraction. Optical properties are presented as a function of the N2 content in the processing gas mixture and correlated to nitrogen incorporation into the deposited layers. The optical band gap values decreased with increasing N concentration in the films, while a monotonically increasing tendency and a maximum can be observed in case of extinction coefficient and refractive index, respectively. It is also shown that the amount of substitutional N can be increased up to 7.7 at.%, but the higher dopant concentration inhibits the crystallization of the samples. |
| Databáze: | OpenAIRE |
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