Erratum: ‘‘Comparative study between gas- and liquid-phase silylation for the diffusion-enhanced silylated resist process’’ [J. Vac. Sci. Technol. B 9, 3399 (1991)]

Autor: Bruno Roland, Ki-Ho Baik, L. Van den hove
Rok vydání: 1992
Předmět:
Zdroj: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 10:1229
ISSN: 0734-211X
DOI: 10.1116/1.585896
Databáze: OpenAIRE