The influence of gate-metallization potential drop on transient GTO characteristics

Autor: Edvard Nordlander, M. Bakowski, F. Vojdani, J. Vobecky, H. Bleichner
Rok vydání: 2003
Předmět:
Zdroj: Technical Digest., International Electron Devices Meeting.
DOI: 10.1109/iedm.1988.32889
Popis: A surveillance instrument has been developed for the measurement of the excess-carrier distribution in GTO (gate turn-off thyristor) samples at all stages of operation. The instrument, an optical scanner, allows the visualization of the measurements as 3-D maps of the distributions for time- and space-resolved inspections of the electrical behavior of the component. The optical scanner was used to investigate whether the gate-metallization pattern resistance would influence the transient characteristics of the GTO components. The findings clearly show a strong dependence of turn-off behavior on lateral gate-metallization potential drop in a two-fingered structure. >
Databáze: OpenAIRE