Silicon Surface Metal Contamination Measurements using Grazing-Emission XRF Spectrometry

Autor:	P.K. de Bokx, G. Wiener, Marc Heyns, S. J. Kidd, S. De Gendt, M. Baeyens, Paul Mertens, K. Kenis, D. M Knotter
Rok vydání:	1997
Předmět:	Materials science Metal contamination Silicon chemistry Analytical chemistry Fluorescence spectrometry chemistry.chemical_element Wafer Contamination Mass spectrometry Microbiology Fluorescence
Zdroj:	MRS Proceedings. 477
ISSN:	1946-4274
DOI:	10.1557/proc-477-397
Popis:	Grazing-Emission X-Ray Fluorescence Spectrometry (GEXRF) is a new analytical X-ray fluorescence technique, which like TXRF takes advantage of the total-reflection phenomenon. The main advantage of GEXRF over TXRF is its sensitivity towards light elements. This paper presents straight GEXRF and VPD-DC-GEXRF analysis results for Na, Mg, Al, K and Ca surface contamination on silicon wafers.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::1ad638b17b24609eb6e3ed8d106632de https://doi.org/10.1557/proc-477-397 Zobrazit plný text záznamu Full text from SpringerLink