High Plasmonic Resonant Reflection and Transmission at Continuous Metal Films on Undulated Photosensitive Polymer
| Autor: | S. Tonchev, I. Miloushev, T. Tenev, Rumiana Peyeva, Olivier Parriaux |
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| Rok vydání: | 2013 |
| Předmět: |
Materials science
business.industry Anomalous reflection Biophysics Dielectric engineering.material Biochemistry Metal Optics Transmission (telecommunications) visual_art visual_art.visual_art_medium Reflection (physics) engineering Optoelectronics Noble metal business Photosensitive polymer Plasmon Biotechnology |
| Zdroj: | Plasmonics. 9:311-317 |
| ISSN: | 1557-1963 1557-1955 |
| Popis: | Whereas noble metal films deposited directly onto an undulated photosensitive polymer exhibit plasmon-mediated resonant transmission of free-space waves accompanied by excess losses of approximately 40 %, adequate hard baking of the photosensitive polymer, together with pre- and post-deposition of nanometer-thick ZnS or MgF2 dielectric interfacial layers, restores excellent propagation conditions for the long-range plasmon mode, reducing resonant transmission excess losses to 10 %, and creating the conditions for the experimental evidence of the long-sought plasmonic anomalous reflection phenomenon. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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