New polymer platform of BARC for ArF lithography

Autor:	Yoshiomi Hiroi, Takashi Matsumoto, Rikimaru Sakamoto, Sangwoong Yoon, Young-Ho Kim, Sang-Mun Chon, Daisuke Maruyama, Seok Jin Han, Young-Hoon Kim, Yasushi Sakaida, Yasuyuki Nakajima, EunYoung Yoon, Takahiro Kishioka
Rok vydání:	2005
Předmět:	chemistry.chemical_classification Materials science Etching rate technology industry and agriculture Nanotechnology Polymer Weight control law.invention Resist chemistry Polymerization law Addition polymer sense organs Photolithography Lithography
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.599421
Popis:	We found a new polymer platform for ArF BARC that can be prepared by addition polymerization. This system not only improves resist pattern collapse, but also allows control of the optimum film thickness, and etch rate by combination of compounds, method of polymerization (molecular weight control), and additives. Moreover, these materials have the unique characteristic that the resist profiles change little even if the type of resist changes.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::19ff2498295652027cb303df1156d146 https://doi.org/10.1117/12.599421 Zobrazit plný text záznamu