Hybrid structures by direct write lithography—Tuning the contrast and surface topography of grayscale photoresist with nanoimprint
| Autor: | Helmut Schift, Sijia Xie, Christine Schuster, Jan Erjawetz |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
Diffraction
chemistry.chemical_classification Materials science Thermoplastic business.industry Process Chemistry and Technology Process (computing) Photoresist Grayscale Surfaces Coatings and Films Electronic Optical and Magnetic Materials Resist chemistry Materials Chemistry Optoelectronics Electrical and Electronic Engineering business Instrumentation Lithography Maskless lithography |
| Zdroj: | Journal of Vacuum Science & Technology B. 39:052603 |
| ISSN: | 2166-2754 2166-2746 |
| DOI: | 10.1116/6.0001206 |
| Popis: | Combining microstructures of different dimensions benefits from hybrid manufacturing strategies that use nanoimprint for generating regular large area structures and laser lithography for larger grayscale topography. While the individual processes are straightforward, due to the thermoplastic property of the positive resist used for grayscale lithography, diffraction on surface gratings and degradation of photoactive substances require a careful choice of the order of process steps, and balance of process, temperatures, and dimensions. |
| Databáze: | OpenAIRE |
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