On the influence of reactive gases on sputtering and secondary ion emission

Autor:	P.J. Martin, W.O. Hofer
Rok vydání:	1978
Předmět:	Microprobe Yield (engineering) Materials science General Engineering Analytical chemistry chemistry.chemical_element General Chemistry Nitrogen Oxygen Ion chemistry Sputtering General Materials Science Atomic physics Inert gas Titanium
Zdroj:	Applied Physics. 16:271-278
ISSN:	1432-0630 0340-3793
Popis:	As a continuation of earlier sputtering yield measurements in an ion microprobe, the influence of oxygen and nitrogen on sputtering yield, ionisation efficiency and depth resolutions has been studied. For inert gas bombardment the yield of Ti and V falls sharply at a certain oxygen exposure. While this decrease in yield can be correlated with an increase in surface binding energy in the case of titanium, cone formation causes the yield to drop for oxygen exposed vanadium. In contrast, during nitrogen bombardment the only effect of oxygen exposure is a drastic increase of the ionisation efficiency; the sputtering yield or the depth resolution Δz/z is hardly influenced by oxygen coverage. As was observed earlier in the case of Cu−Ni layers, Δz is essentially constant for erosion depthsz≳800 A, thus yielding better resolution at large depths than is to beexpected from a sequential layer removal model. The extent of the transition zone Δz, is determined by surface topography and thus depends on the target composition as well as its structure.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::19be5637de0de98c727f59bfeed3826c https://doi.org/10.1007/bf00885122 Zobrazit plný text záznamu Full text from SpringerLink