Catalyst-Assisted Electroless Flattening of Ge Surfaces in Dissolved-O2-Containing Water
| Autor: | Mizuho Morita, Kenta Arima, Yasuhisa Sano, Kazuto Yamauchi, Takeshi Okamoto, Atsushi Mura, Tatsuya Kawase, Kentaro Kawai, Yusuke Saito |
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| Rok vydání: | 2015 |
| Předmět: |
Imagination
Chemical substance Materials science media_common.quotation_subject Nanotechnology Isotropic etching Catalysis law.invention Metal Magazine Chemical engineering law Etching (microfabrication) visual_art Electrochemistry visual_art.visual_art_medium Science technology and society media_common |
| Zdroj: | ChemElectroChem. 2:1656-1659 |
| ISSN: | 2196-0216 |
| DOI: | 10.1002/celc.201500245 |
| Popis: | Control of the microroughness of Ge surfaces is required to realize field-effect transistors with high performances. We propose a novel surface-flattening process for Ge that involves the preferential transformation of surface protrusions on Ge into soluble GeO2 with the help of a catalyst in water. To carry out this process, we developed a setup comprising a catalyst plate covered with a Pt film in contact with a Ge surface in saturated O2-dissolved water. The role of the metallic film is to enhance the oxygen reduction reaction in water that accompanies the oxidation of protrusions or microbumps on a Ge surface. After presenting the fundamental etching properties of a Ge surface treated with this metal-assisted chemical etching method, we demonstrate that our water-based process creates a flattened Ge surface that has few protrusions with a lateral size on the order of 10 nm. |
| Databáze: | OpenAIRE |
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