Nucleation and Growth Dependence of ALD WNC on Substrate Surface Condition

Autor: Karen Maex, Jorg Schuhmacher, Youssef Travaly, Thomas Abell
Rok vydání: 2004
Předmět:
Zdroj: MRS Proceedings. 812
ISSN: 1946-4274
0272-9172
DOI: 10.1557/proc-812-f2.7
Popis: ALD WNC nucleation and growth was observed strongly affected by different substrate materials and surface chemistries. Nucleation was inhibited on most pristine low k surfaces, which is attributed to low concentrations of chemisorption sites (Si-OH). Plasma treatments were used to alter the surface chemistry to improve nucleation. Surface closure and surface roughness of the WNC layer were found to strongly correlate with starting surface condition. Resistivities of the resulting films were also found dependent on starting surface treatment. But the relationship between W content of the films, surface treatment and resistivity was not fully comprehended.
Databáze: OpenAIRE
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