Autor:	Robert L. Brainard, Bharath Srivats, Shahid Memon, Leonidas E. Ocola, Sanjana Das, Jonathan Schad, Greg Denbeaux, Henry C. Herbol, Justin Torok
Rok vydání:	2014
Předmět:	Materials science Polymers and Plastics business.industry Extreme ultraviolet lithography Organic Chemistry Electron Penetration (firestop) Photoresist Secondary electrons Optics Materials Chemistry Optoelectronics business Penetration depth
Zdroj:	Journal of Photopolymer Science and Technology. 27:611-615
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.27.611
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::19679deb174d94b6ae62118090618938 https://doi.org/10.2494/photopolymer.27.611 Zobrazit plný text záznamu