Influence of Wall Conditioning State on AR Plasma Emission in a Processing Chamber

Autor:	Jaemin Song, Jongsik Kim, Dae Chul Kim, Mi-Young Song, Jung-Sik Yoon, Sung-Hyun Son, Ji-Won Kwon, Sangwon Ryu, Gon-Ho Kim
Rok vydání:	2020
Zdroj:	2020 IEEE International Conference on Plasma Science (ICOPS).
DOI:	10.1109/icops37625.2020.9717724
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::19206182d7cbc63b97eb5825e147a776 https://doi.org/10.1109/icops37625.2020.9717724 Zobrazit plný text záznamu