Process control capability using a diaphragm photochemical dispense system
| Autor: | Joseph Zahka, Scott F. Merrow, Terrell D. Cambria |
|---|---|
| Rok vydání: | 1991 |
| Předmět: |
Materials science
Process (computing) Diaphragm (mechanical device) Photoresist engineering.material Condensed Matter Physics Photochemistry Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Bellows Coating law embryonic structures engineering Process control Electrical and Electronic Engineering Polyimide Filtration |
| Zdroj: | Microelectronic Engineering. 13:551-554 |
| ISSN: | 0167-9317 |
| Popis: | This paper describes methods and equipment which can be used to optimize the photochemical dispense process from a contamination and process control perspective. It describes the impact of point-of-use (POU) filtration on coating quality and gel removal; compares the performance of bellows and diaphragm pump designs with photoresist; and quantifies defect reduction studies using POU filtration of polyimide and spin-on-glass (SOG) photochemicals. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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