Dissolution Enhancement of Immersion Barrier Coat by Post Exposure Bake

Autor:	Man-Hyoung Ryoo, Jin-Young Yoon, Hyun-Woo Kim, Sang-Gyun Woo, Jung-Hwan Ha, Mitsuhiro Hata, Han-Ku Cho
Rok vydání:	2005
Předmět:	chemistry.chemical_classification Post exposure Materials science Polymers and Plastics chemistry Organic Chemistry Materials Chemistry Immersion (virtual reality) Nanotechnology Polymer Composite material Acid group Dissolution
Zdroj:	Journal of Photopolymer Science and Technology. 18:621-625
ISSN:	1349-6336 0914-9244
Popis:	Immersion barrier coat was formulated and evaluated on ArF photoresists from view points of profiles and lithographic performances with both dry and wet conditions. Hydrophobic group, acid group, and polar group were introduced into base polymer to realize water-barrier property and developability. In order to compensate the in sufficient developability, an additive is included in the formulation that can enhance the developability.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::18fa8d478950f00ede117cb7d419db3c https://doi.org/10.2494/photopolymer.18.621 Zobrazit plný text záznamu