Mass dependence of sputtering characteristics for a number of metals with different properties

Autor:	A. S. Mosunov, V. E. Yurasova, E. Yu. Zykova, John Colligon
Rok vydání:	2010
Předmět:	Chemistry Surface binding Condensed Matter Physics Surfaces Coatings and Films Ion Metal Condensed Matter::Materials Science Molecular dynamics Lattice constant Physics::Plasma Physics Sputtering visual_art visual_art.visual_art_medium Atomic physics Instrumentation
Zdroj:	Vacuum. 85:546-549
ISSN:	0042-207X
DOI:	10.1016/j.vacuum.2010.10.002
Popis:	Molecular dynamic simulation has been used to study how the sputtering characteristics of metal polycrystals are dependent on the mass m 1 of bombarding ions of low-energy E 0 . The influence of target parameters on mass dependence of sputtering has been calculated for Al, Ba, Ce and Au, which were not previously studied. These metals have very different values of density ρ , the lattice constant d , and the surface binding energy E b (the parameters that define the sputtering process). The features of sputtering characteristics for the metals studied are discussed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::18dffdcef8f6f5f5ab0f576480823c7d https://doi.org/10.1016/j.vacuum.2010.10.002 Zobrazit plný text záznamu Full Text from ScienceDirect