Properties of In2O3 Films, Deposited by dc-Magnetron Sputtering on Al2O3 Substrates with Different Temperatures

Autor: I. V. Zhikharev, Alexandr Tikhii, N. V. Korchikova, Yuriy I. Yurasov, Vladimir A. Gritskikh, S. V. Kara-Murza, Tatyana V. Krasnyakova, Yuri M. Nikolaenko, Anatoly V. Pavlenko
Rok vydání: 2017
Předmět:
Zdroj: Springer Proceedings in Physics ISBN: 9783319560618
DOI: 10.1007/978-3-319-56062-5_5
Popis: The In2O3 films were deposited by dc-magnetron sputtering on substrates of Al2O3 (012) at different temperatures (20–600 °C). Ellipsometric and optical transmission measurements were used to investigate the effect of substrate temperature and annealing on the properties of the films. The profiles of refraction index, direct and “indirect” band gap were determined. The annealing naturally results in unification of the properties of the explored films: the refraction index grows, the degree of homogeneity on a thickness increases and the thickness of the disturbed layer on the surface of films decreases, i.e. film material is compact. Also the annealing reduces the energies of band-to-band transitions. This can be explained by a decrease of influence of barriers in the annealed films. However, the width of direct band gap changes more than “indirect” one. It seems that this is related to the mechanism of indirect transitions: phonon participation facilitates the interband transitions, even if they are hampered by the presence of extra barriers caused by grain boundary. The last result may indirectly evidence of the existence of indirect transitions in this material.
Databáze: OpenAIRE