The effect of 130 keV N2+ ion implantation post-treatment on the micro- and nanostructure of sputtered chromium nitride thin films

Autor: Sascha Louring, Christian Sloth Jeppesen, Benjamin Watts, Bjarke Holl Christensen, Kristian Rechendorff, Lars Pleth Nielsen, K.P. Almtoft
Rok vydání: 2020
Předmět:
Zdroj: Surface and Coatings Technology. 389:125635
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2020.125635
Popis: Chromium nitride thin films were prepared by magnetron sputtering using an industrial-scale commercial coating unit. One of the thin films was post-treated by N2+ ion implantation using an ion accelerator operating at 130 keV. The chemical, structural, and mechanical changes induced by ion implantation were analysed with Rutherford Backscattering Spectrometry (RBS), Transmission Electron Microscopy (TEM), Energy Dispersive X-ray (EDX) analysis, X-Ray Diffraction (XRD), Near Edge X-ray Absorption Fine Structure (NEXAFS) spectroscopy, Extended X-ray Absorption Fine Structure (EXAFS) spectroscopy and nanoindentation. The as-deposited sample has the hcp Cr2N lattice structure. It was found that the ion-implantation gave rise to an increased nitrogen concentration in the approximately 150 nm outer sample region. In addition, ion implantation caused an increase in the average crystalline grain size without changing the hcp Cr2N lattice structure. It is suggested that the additional nitrogen from implantation is embedded in the Cr2N lattice structure by filling up vacancies.
Databáze: OpenAIRE