Probing into the metal-graphene interface by electron transport measurements

Autor:	Ya Chi Li, Yen-Fu Lin, Wen-Bin Jian, Sheng Tsung Wang, Chung Kuan Lin, Shih-ying Hsu, Cheng Chieh Lai, Chia Chen Pao
Rok vydání:	2013
Předmět:	Materials science Physics and Astronomy (miscellaneous) business.industry Graphene Liquid helium Contact resistance Transistor Molecular electronics Nanotechnology Thermal conduction Electron transport chain law.invention law Optoelectronics business Quantum tunnelling
Zdroj:	Applied Physics Letters. 102:033107
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.4789554
Popis:	Metal-graphene contact recently attracts much attention because of its effects on the performance and the operational speed of graphene field-effect transistor. Simple two-probe graphene devices on mechanically exfoliated graphene flakes are fabricated and the temperature behavior of resistance is measured from room temperature down to liquid helium temperature for the study of electron transport in the interface. Comparing experimental data with several different transport theories, it is confirmed that the model of fluctuation-induced tunneling conduction describes precisely the electron transport and indicates the existence of a thin insulating layer in the metal-graphene interface. Through the interface probing by electron transport measurements, the way to reduce the contact resistance is suggested.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::1828274aeb5d8fad2be177c66dbf701c https://doi.org/10.1063/1.4789554 Zobrazit plný text záznamu