Surface characterization determined from the secondary electron emission coefficient upon ion bombardment
| Autor: | Faro Hechenberger, Daniel Fridrich, Lorenz Ballauf, Hannah Thiel, Benedikt Auer, Manuel Drost, Stefan Raggl, Paul Scheier, Felix Duensing, Alexander Menzel |
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| Rok vydání: | 2021 |
| Předmět: |
Yield (engineering)
Materials science Ion beam Scanning electron microscope General Physics and Astronomy 02 engineering and technology Surfaces and Interfaces General Chemistry Electron 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Molecular physics 0104 chemical sciences Surfaces Coatings and Films Ion Characterization (materials science) X-ray photoelectron spectroscopy Sputtering 0210 nano-technology |
| Zdroj: | Applied Surface Science. 538:148042 |
| ISSN: | 0169-4332 |
| Popis: | The ion induced electron emission yield upon Ar+ ion impact at 420 eV was measured for a stainless-steel sample that was partially covered with a 50 nm thick gold layer. The ion induced electron emission yield for the two target materials differs strongly and enables to reproduce the shape of the gold film with a spatial resolution that corresponds to the width of the ion beam, which is 240 µm in the present case. Details in the two-dimensional map of the ion induced electron emission yield are explained by comparison with optical and scanning electron microscopy as well as with X-ray photoelectron spectroscopy measurements of the sample surface. In contrast to the sputtering efficiency, the ion induced electron emission yield does not depend on the orientation of the crystal structure. |
| Databáze: | OpenAIRE |
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