Final report for the Sept. 1997 - Jan. 2000 period of Contract No. DE-FG02-97ER54445. Fundamental science of high-density fluorocarbon plasmas

Autor:	H.M. Anderson, J.L. Cecchi, G.S. Oehrlein
Rok vydání:	2001
Předmět:	Plasma etching Etching (microfabrication) Chemistry Scattering Plasma diagnostics Fluorocarbon Plasma Atomic physics Ion Characterization (materials science)
DOI:	10.2172/810328
Popis:	This report describes the results obtained during the two and a half years of work on the contract ''Fundamental Science of High-Density Fluorocarbon Plasmas.'' This program established critical elements of the scientific knowledge base of high-density fluorocarbon plasmas used for SiO{sub 2} patterning. To this end the authors characterized the species that exist in the gas phase and the processes that occur at relevant surfaces in contact with the plasma using complementary diagnostic instrumentation for plasma and surface characterization at two universities. By moving diagnostics from one university to the other, the full spectrum of diagnostics was applied to a single plasma reactor and fluorocarbon plasma etching process. The results of these measurements were correlated with data obtained when patterning SiO{sub 2} using identical conditions. In parallel, a reactive beam scattering system was employed to establish the consequences of the interaction of mass- and energy-resolved low-energy (20 to 300 eV) ions with SiO{sub 2} and resist surfaces.
Databáze:	OpenAIRE
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