Robust Three-Metallization Back End of Line Process for 0.18 µm Embedded Ferroelectric Random Access Memory
| Autor: | Sung-young Lee, Do-Hyun Choi, Kinam Kim, Hongsik Jeong, Bon-jae Koo, Seung-Kuk Kang, Jung-Hun Park, Hyoung-Seub Rhie, Young-Min Kang, H. J. Joo, Hyunho Kim |
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| Rok vydání: | 2005 |
| Předmět: |
Hardware_MEMORYSTRUCTURES
business.industry Computer science General Engineering Process (computing) General Physics and Astronomy Hardware_PERFORMANCEANDRELIABILITY Dielectric Ferroelectricity law.invention Back end of line Capacitor CMOS Hardware_GENERAL law Optoelectronics ComputerSystemsOrganization_SPECIAL-PURPOSEANDAPPLICATION-BASEDSYSTEMS Static random-access memory business EEPROM |
| Zdroj: | Japanese Journal of Applied Physics. 44:2706 |
| ISSN: | 1347-4065 0021-4922 |
| DOI: | 10.1143/jjap.44.2706 |
| Popis: | We developed ferroelectric random access memory (FRAM)-embedded smartcards in which FRAM replaces electrically erasable PROM (EEPROM) and static random access memory (SRAM) to improve the read/write cycle time and endurance of data memories during operation, in which the main time delay retardation observed in EEPROM embedded smartcards occurs because of slow data update time. EEPROM-embedded smartcards have EEPROM, ROM, and SRAM. To utilize FRAM-embedded smartcards, we should integrate submicron ferroelectric capacitors into embedded logic complementary metal oxide semiconductor (CMOS) without the degradation of the ferroelectric properties. We resolved this process issue from the viewpoint of the back end of line (BEOL) process. As a result, we realized a highly reliable sensing window for FRAM-embedded smartcards that were realized by novel integration schemes such as tungsten and barrier metal (BM) technology, multilevel encapsulating (EBL) layer scheme and optimized intermetallic dielectrics (IMD) technology. |
| Databáze: | OpenAIRE |
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