Characterization of potassium tantalum niobate films formed by metalorganic deposition

Autor:	Adolph L. Micheli, Richard A. Waldo, Antonio B. Catalan, Yen‐Lung Chen, Norman W. Schubring, Curtis A. Wong, Joseph V. Mantese
Rok vydání:	1992
Předmět:	Permittivity chemistry Electric field Analytical chemistry Tantalum General Physics and Astronomy Curie temperature Mineralogy chemistry.chemical_element Chemical vapor deposition Coercivity Thin film Polarization (electrochemistry)
Zdroj:	Journal of Applied Physics. 72:615-619
ISSN:	1089-7550 0021-8979
DOI:	10.1063/1.351842
Popis:	Thin films of potassium tantalum niobate, KTa0.6Nb0.4O3, with a Curie temperature of 20 °C were deposited on a variety of substrates by metalorganic deposition. These films had peak relative permittivities of 16 000 at 20 °C. Hysteresis plots of electric displacement as a function of electric field, taken at 0 °C, revealed a coercive field of 800 V/cm, a spontaneous polarization of 3.9 μC/cm2, and a remnant polarization of 0.5 μC/cm2. The hysteresis loops did not change significantly as the temperature was varied down to −100 °C.
Databáze:	OpenAIRE
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