Structure, hardness, and tribological properties of reactive magnetron sputtered chromium nitride films

Autor:	Neil P. Baker, Kevin C. Walter, Xiao-Ming He, B. A. Kehler, Michael Nastasi, Y. Nakamura
Rok vydání:	2000
Předmět:	Materials science Metallurgy Analytical chemistry Biasing Surfaces and Interfaces Crystal structure Sputter deposition Condensed Matter Physics Surfaces Coatings and Films Ion chemistry.chemical_compound chemistry Sputtering Thin film Chromium nitride Deposition (law)
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 18:30-36
ISSN:	1520-8559 0734-2101
Popis:	Chromium nitride (CrN) films with Cr/N atomic ratios of 0.73–1.46 were prepared by reactive dc- magnetron sputtering with Ar as the sputtering gas and N2 as the reactive gas. The application of a negative bias voltage to the substrates and the decrement of the gas flow ratio of N2 to Ar (or FN2/FAr) promoted the growth of CrN films with preferred orientations of (200)+(220), high Cr/N ratios, and high densities. The functional hardness and compressive stress were highly dependent on the magnitude of the bias voltage and the Cr/N ratio that was adjusted by the FN2/FAr ratio during film deposition. The optimal energy conditions for ion impingement on growing CrN films with compact columnar crystal structure, high hardness, and enhanced tribological properties were studied with respect to the modulations of the bias voltages and the Cr/N ratios. The CrN films with high hardness and high wear resistance were synthesized in this study at low bias voltages of −(100–300) V and FN2/FAr ratios of 1–3.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::16f552d356bbf4e68cfdb865c77f7e4b https://doi.org/10.1116/1.582154 Zobrazit plný text záznamu