HIGH DOSE IMPLANTATION OP NITROGEN INTO SILICON: RBS AND NUCLEAR REACTIONS MEASUREMENTS

Autor:	V. Y. Arbuzov, I. Y. Grande, V. P. Korobeinlkov, T. M. Pyatkova, V. N. Baghaev, T. I. Starikova
Rok vydání:	1989
DOI:	10.1515/9783112575666-107
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::16e4e5e1eec29108d08abece9369288d https://doi.org/10.1515/9783112575666-107 Zobrazit plný text záznamu