The Development of Structure in Electrodeposited Co

Autor: T. S. Eagleton, J. P. G. Farr
Rok vydání: 2002
Předmět:
Zdroj: Transactions of the IMF. 80:9-12
ISSN: 1745-9192
0020-2967
DOI: 10.1080/00202967.2002.11871419
Popis: Co layers 25, 50 and 100 nm thick have been electrodeposited onto polycrystalline Cu. The development of the crystal structure of the layers has been examined using crystal orientation mapping (COM) and related to that of the underlying Cu. The magnetic properties of the electrodeposited Co film 100 nm thick have been examined using the MOKE and the magnetic properties have been related to the crystallographic structure.
Databáze: OpenAIRE