Fabry-Perot type antireflective coatings for binary mask applications in ArF and F/sub 2/ excimer laser lithographies

Autor:	Hsuen-Li Chen, C.I. Hsieh, F.H. Ko, Ming-Chung Liu, Y. F. Chuang
Rok vydání:	2004
Předmět:	Materials science Excimer laser business.industry medicine.medical_treatment Binary number Reflectivity law.invention Optics Anti-reflective coating law medicine Structure based Optoelectronics business Argon compounds Fabry–Pérot interferometer
Zdroj:	CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on Lasers and Electro-Optics (IEEE Cat. No.03TH8671).
DOI:	10.1109/cleopr.2003.1277293
Popis:	We demonstrated an antireflective coating structure based on a Fabry-Perot structure for binary masks of ArF and F/sub 2/ excimer laser lithographies. Reflectance of less than l% at both 193 and 157 nm can be achieved.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::15df39279729f93448c31fa2de7a03e8 https://doi.org/10.1109/cleopr.2003.1277293 Zobrazit plný text záznamu