Fabrication and characterization of periodic arrays of epitaxial Ni-silicide nanocontacts on (110)Si

Autor: H. Chen, Shao Liang Cheng, C.F. Chuang, L.H. Chang
Rok vydání: 2015
Předmět:
Zdroj: Applied Surface Science. 343:88-93
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2015.03.058
Popis: In this study, we report on the fabrication and characterization of periodic Ni and Ni-silicide nanocontact arrays on (1 1 0)Si substrates. From transmission electron microscopy and selected-area electron diffraction analysis, it is found that the epitaxial NiSi 2 is the first and the only silicide phase formed in the nanoscale Ni contact/(1 1 0)Si sample after annealing at a temperature as low as 300 °C, demonstrating that the nanoscale Ni contact is more favorable for the epitaxial growth of NiSi 2 phase on (1 1 0)Si. The orientation relationship between the epitaxial NiSi 2 nanocontacts and the (1 1 0)Si substrate is identified as [1 1 0]NiSi 2 //[1 1 0]Si and ( 1 ¯ 1 1 ¯ )NiSi 2 //( 1 ¯ 1 1 ¯ )Si. For the samples annealed at higher temperatures, all the epitaxial NiSi 2 nanocontacts formed on (1 1 0)Si are anisotropic in shape and elongated along the crystallographic 1 1 ¯ 0 directions. The observed results can be attributed to the higher surface area to volume ratio of Ni nanocontacts and the faster growth rate along the 〈1 1 0〉 directions than along other directions. The size and periodicity of the nanocontacts can be readily controlled by adjusting the diameter of the colloidal nanosphere template. The self-assembled approach proposed here will provide the capability to fabricate other highly-ordered metal silicide nanocontact arrays and may offer potential applications in constructing silicide-based nanodevices.
Databáze: OpenAIRE