Hexafluoroacetone in deep UV resist chemistry: new resins, dissolution inhibitors and crosslinkers

Autor:	Georgi Pawlowski, Horst Röschert, Klaus-Jürgen Przybilla
Rok vydání:	1992
Předmět:	Polymers and Plastics Chemistry Aryl Organic Chemistry Photoresist Condensation reaction Hexafluoroacetone chemistry.chemical_compound Reagent Functional group Materials Chemistry Organic chemistry Reactivity (chemistry) Dissolution
Zdroj:	Journal of Photopolymer Science and Technology. 5:85-92
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.5.85
Popis:	Some recent investigations on hexafluoroacetone (HFA) have revealed that this reagent offers a variety of interesting aspects and potential applications for new photoresist products. The 2- hydroxyhexafluoroisopropyl group (HHFIP), obtained via condensation reaction of HFA with aromatic compounds, exhibits properties comparable to phenolic groups with respect to reactivity and acidity. This allows transfer of a variety of chemistries presently exclusively linked to phenol-type compounds, such as reversible blocking, to HHFIP substituted compounds, resulting in alkali-soluble matrix resins, polymer functional group deprotection materials, or dissolution inhibition, and crosslinking type materials. In contrast to phenols, the electron density of the aryl group is reduced due to the electron-withdrawing properties of the HHFIP group, resulting in materials with significantly changed reactivities of the aromatic moieties.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::14bf86c6976fd087d22e6c8fc14c58fa https://doi.org/10.2494/photopolymer.5.85 Zobrazit plný text záznamu