Plasma Enhanced Chemical Vapor Deposition Synthesizing Carbon Nitride Hard Thin Films
| Autor: | X.J. Fan, Zhihong Zhang, Wei Zhang, Ming-sheng Ye, Xian-quan Meng, H.X. Guo |
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| Rok vydání: | 1998 |
| Předmět: |
Materials science
General Physics and Astronomy Diamond chemistry.chemical_element engineering.material Combustion chemical vapor deposition chemistry.chemical_compound Carbon film chemistry Chemical engineering Plasma-enhanced chemical vapor deposition Vickers hardness test engineering Thin film Carbon nitride Carbon |
| Zdroj: | Chinese Physics Letters. 15:913-915 |
| ISSN: | 1741-3540 0256-307X |
| Popis: | Using plasma enhanced chemical vapor deposition and SiC and carbon buffer layers, we have obtained carbon nitride thin films on Si(100) and Si(111). The x-ray diffraction and x-ray photoelectron spectroscopy are used to characterize the thin films. The Vickers hardness of the carbon nitride thin films is more than 5100 kgf/mm2 and comparable to that of diamond. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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