Mn2O3 Slurry Reuse by Circulation Achieving High Constant Removal Rate

Autor:	Sadahiro Kishii, Toshiro Doi, Satoru Watanabe, Syuhei Kurokawa, Yoshihiro Arimoto, Kenzo Hanawa, Ko Nakamura
Rok vydání:	2012
Předmět:	Materials science Chemical-mechanical planarization Abrasive General Engineering Slurry General Physics and Astronomy Reuse Pulp and paper industry Fumed silica
Zdroj:	Japanese Journal of Applied Physics. 51:04DB07
ISSN:	1347-4065 0021-4922
DOI:	10.1143/jjap.51.04db07
Popis:	Fumed silica is widely used in SiO2 chemical mechanical polishing (CMP). In semiconductor processes, only fresh slurry is used, and used slurry is disposed. Sustainable development demands a reduction in waste. Since reuse of slurry is effective for reducing the amount of used slurry generated, we investigated the reuse of Mn2O3 slurry and conventional fumed silica slurry. In both cases, abrasive concentration decreases as reuse time increases. The removal rate for Mn2O3 slurry maintains a value 4 times that of the conventional fumed silica slurry during slurry reuse, because the removal rate for Mn2O3 slurry is almost constant for solid concentrations between 1.0 and 10 wt %. Pad conditioning was not performed for Mn2O3 slurry. The removal rate for conventional slurry decreases as the number of times of reuse increases, even when pad conditioning is appropriately performed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::14455e810004f6a8a22040b74f8d3524 https://doi.org/10.1143/jjap.51.04db07 Zobrazit plný text záznamu