Characterization of the Al/RuO2 Interface Upon Thermal Annealing

Autor:	Elzbieta Kolawa, Quat T. Vu, M-A. Nicolet
Rok vydání:	1990
Předmět:	Chemical kinetics Interfacial reaction Materials science chemistry Aluminium Annealing (metallurgy) Transmission electron microscopy Kinetics Contact resistance chemistry.chemical_element Crystallite Composite material
Zdroj:	MRS Proceedings. 181
ISSN:	1946-4274 0272-9172
DOI:	10.1557/proc-181-531
Popis:	We have characterized the Al/RuO2 interface after annealing at temperatures in the range 450° C-550° C for durations up to several hours by backscattering spectrometry, cross-sectional transmission electron microscopy, and electrical four point probe measurement of specially designed structures. The electrical measurement yields the specific contact resistance of the interface by applying a transmission line type model developped for this purpose. An interfacial aluminum-oxygen polycrystalline compound is shown to grow with annealing temperature and duration, with a concurrent reduction of a thin layer of RuO2. However, the specific contact resistance between Al and RuO2 is found to decrease with annealing duration at 500°C. This last result indicates that the interfacial reaction does not lead to an insulating interface as could have been expected if the growth were pure and dense A12O3.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::140d12af5d089f34bebb13182c21c482 https://doi.org/10.1557/proc-181-531 Zobrazit plný text záznamu Full text from SpringerLink