EFFECT OF OXYGEN ADSORPTION ON THE PHOTOELECTRON YIELD FROM TUNGSTEN IN THE VACUUM ULTRAVIOLET

Autor:	L. R. Hughey, R. P. Madden, B. J. Waclawski
Rok vydání:	1967
Předmět:	Yield (engineering) Physics and Astronomy (miscellaneous) technology industry and agriculture Analytical chemistry chemistry.chemical_element Tungsten Photochemistry Oxygen Photocathode Adsorption chemistry Torr Work function Crystallite
Zdroj:	Applied Physics Letters. 10:305-307
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.1754822
Popis:	The effect of adsorbed oxygen on the photoelectron yield of bulk polycrystalline tungsten was studied at photon energies of 7.7, 10.2, 11.8, 16.9, and 21.2 eV. Use of ultrahigh vacua ∼3 × 10−10 torr ensured sample cleanliness prior to oxygen exposure. The photoelectron yield decreases with oxygen exposure because of the increase in the electronic work function of the tungsten photocathode. However, at hv = 21.2 eV, an increase in photoelectron yield with oxygen exposure also appears and is believed to be due to photoelectron emission from the adsorbed oxygen atoms.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::13f7222218da4c2af80bdfe5e68445ea https://doi.org/10.1063/1.1754822 Zobrazit plný text záznamu