Process window improvement for fin cut layer in self-aligned double-patterning process based on backscattered electron imaging
| Autor: | Yu Zhang, David Wei Zhang, Yuyang Bian, Biqiu Liu, Cong Zhang, Jun Huang, Jiawang Song, Yang Gao, Qiang Zhou, Wei Chen, Siqun Xiao, Shmuel Ben Nissim, Kevin Houchens, Omri Baum, Amit Zakay, Tal Ayzik, Yaniv Abramovitz |
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| Rok vydání: | 2022 |
| Zdroj: | Journal of Micro/Nanopatterning, Materials, and Metrology. 21 |
| ISSN: | 2708-8340 |
| DOI: | 10.1117/1.jmm.21.4.041605 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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