Positron implantation profile in kapton

Autor: J. Kansy, K. Płotkowski, T. J. Panek
Rok vydání: 1988
Předmět:
Zdroj: Il Nuovo Cimento D. 10:933-940
ISSN: 0392-6737
DOI: 10.1007/bf02450195
Popis: Measurements of positrons' implantation profile were made with geometry as in the majority of PAT experiments, making use of the difference in values of mean lifetimes of positrons in the absorber and in the detector. The function describing the absorption of positrons in the absorber taking into account measurement geometry was fitted to the experimental data. The correction to the exponential relation occurring in this function is the dominating factor for small thicknesses of the absorber. In this analysis various values of positrons' backscatter coefficients of the nickel and of the kapton were also taken into account.
Databáze: OpenAIRE
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