SiC-SiC temporary bonding compatible with rapid thermal annealing at 1000 °C

Autor: Miyuki Uomoto, Fengwen Mu, Haruo Nakazawa, Kenichi Iguchi, Takehito Shimatsu, Tadatomo Suga
Rok vydání: 2019
Předmět:
Zdroj: 2019 6th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D).
DOI: 10.23919/ltb-3d.2019.8735291
Popis: A SiC-SiC temporary bonding compatible with rapid thermal annealing at $\sim 1000^{\circ } \mathrm{C}$ has been realized. Two SiC wafers were bonded at room temperature via an intermediate Ni nano-film. After the rapid thermal annealing, the bonding was dramatically weakened and the de-bonding could be achieved at the interface. The mechanisms of this temporary bonding method has been investigated through interface analyses.
Databáze: OpenAIRE