Atomic layer deposition of iron oxide on a porous carbon substrate via ethylferrocene and an oxygen plasma
| Autor: | Douglas G. Ivey, Matthew Labbe, Zahra Abedi, Kenneth C. Cadien, Michael P. Clark, Anqiang He |
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| Rok vydání: | 2021 |
| Předmět: |
Materials science
Ethylferrocene Iron oxide Oxygen evolution 02 engineering and technology Surfaces and Interfaces General Chemistry Substrate (electronics) engineering.material 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences 0104 chemical sciences Surfaces Coatings and Films chemistry.chemical_compound Atomic layer deposition Electron diffraction chemistry Coating Chemical engineering Transmission electron microscopy Materials Chemistry engineering 0210 nano-technology |
| Zdroj: | Surface and Coatings Technology. 421:127390 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/j.surfcoat.2021.127390 |
| Popis: | Ethylferrocene, a novel precursor for atomic layer deposition (ALD) of iron oxide, was investigated using an oxygen plasma co-reactant. Iron oxide deposition showed a saturating growth rate of 0.1 A/cycle in the temperature range of 150 °C to 250 °C. The iron oxide coating was subsequently deposited on a porous gas diffusion layer (GDL) for use as an air electrode in a zinc-air battery. X-ray microanalysis confirmed deep penetration of the iron oxide into the porosity of the GDL, with a lower substrate temperature providing deeper coverage. Transmission electron microscopy revealed that a uniform ~10 nm thick iron oxide coating encased the GDL particles. Electron diffraction and X-ray photoelectron spectroscopy identified the iron oxide film as α-Fe2O3. Electrochemical characterization of the ALD-coated GDL showcased promising catalytic activity towards the oxygen evolution reaction. |
| Databáze: | OpenAIRE |
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