Enhanced Tunneling Electro-Resistance Ratio for Ferroelectric Tunnel Junctions by Engineering Metal Work Function

Autor:	Yi-Fan Chen, Lee-Wen Hsu, Chia-Wei Hu, Guan-Ting Lai, Yung-Hsien Wu
Rok vydání:	2022
Předmět:	Electrical and Electronic Engineering Electronic Optical and Magnetic Materials
Zdroj:	IEEE Electron Device Letters. 43:208-211
ISSN:	1558-0563 0741-3106
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::11c75a1ea7be45bf95303cfe696c9119 https://doi.org/10.1109/led.2021.3133577 Zobrazit plný text záznamu