| Autor: |
Yuya Sakuraba, S. Bosu, Kesami Saito, Hai Wang, Koki Takanashi |
| Rok vydání: |
2010 |
| Předmět: |
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| Zdroj: |
IEEE Transactions on Magnetics. 46:2052-2055 |
| ISSN: |
0018-9464 |
| DOI: |
10.1109/tmag.2010.2045642 |
| Popis: |
Interlayer exchange coupling was investigated in Co2FeSi(20 nm)/Cr(tCr = 0.6 to 3 nm)/Co2FeSi(7 nm) epitaxial trilayer structures by M - H loop measurement and using a numerical simulation method. The epitaxial growth and the presence of partial B2 ordering in Co2FeSi films were confirmed from the XRD patterns. The bilinear coupling parameter J1 and 90° coupling parameter J2 were determined from the numerical simulation of M - H loops for trilayers. The absence of 180° coupling and the presence of dominating 90° coupling were observed from the comparison between the numerical simulations and measured M - H loops within a wide range of spacer thickness. The strength of the 90° coupling was found to vary with the spacer thickness and only a peak of J2 was observed at tCr = 1.2 nm. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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