Autor:	Ho Seok Ee, Donghyeong Kim, Hong Gyu Park, Min-Kyo Seo, Kwang-Yong Jeong
Rok vydání:	2015
Předmět:	Elastic scattering Total internal reflection Materials science Optics Nanostructure business.industry Scattering Optoelectronics Near and far field business Light scattering Plasmon Numerical aperture
Zdroj:	CLEO: 2015.
DOI:	10.1364/cleo_si.2015.sth3m.2
Popis:	We demonstrate a novel method for measuring far-field scattering of a single nanostructure with a high signal-to-background ratio using total-internal-reflection illumination. Direct far-field scanning overcomes the numerical aperture limit of the typical back-focal plane imaging.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::1113e4720db86b9af5c64c2d81c9feca https://doi.org/10.1364/cleo_si.2015.sth3m.2 Zobrazit plný text záznamu