One-Dimensional Modeling for Magneto-Microwave Plasma Using the Monte Carlo Method

Autor:	Yutaka Kakehi, Kobayashi Junichi, Ikegawa Masato
Rok vydání:	1992
Předmět:	Plasma etching Computer simulation Chemistry Monte Carlo method General Engineering General Physics and Astronomy Plasma Electron cyclotron resonance Ion source Computational physics Physics::Plasma Physics Physics::Space Physics Statistical physics Plasma processing Microwave
Zdroj:	Japanese Journal of Applied Physics. 31:2030
ISSN:	1347-4065 0021-4922
DOI:	10.1143/jjap.31.2030
Popis:	This study discusses modeling of a magneto-microwave plasma used in semiconductor manufacturing equipment such as etching reactors and chemical vapor deposition (CVD) reactors. A one-dimensional simulation program for magneto-microwave plasma was developed. This combines a Monte Carlo particle plasma model and an electromagnetic wave damping model. With the use of this simulation, a plasma production mechanism with electron cyclotron resonance and electromagnetic wave damping in a partially ionized gas can be analyzed. Typical results of the effect of gas pressure on the plasma distribution in plasma processing equipment are presented.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::10c1faa17d3e8208e12d67887506eca2 https://doi.org/10.1143/jjap.31.2030 Zobrazit plný text záznamu