Atomic Layer Deposition and Characterization of SiO2 Films from Noble Amino Silane and Ozone

Autor: Kwangseon Jin, Jae-Kyung Kim, Jinsik Kim, Jongwan Jung, Won-Jun Lee
Rok vydání: 2011
Zdroj: ECS Meeting Abstracts. :1383-1383
ISSN: 2151-2043
DOI: 10.1149/ma2011-01/22/1383
Popis: not Available.
Databáze: OpenAIRE