| Popis: |
Although Extreme Ultra Violet (EUV) at 13.5 nm wavelength already moved into commercialization state, serious technical issues remain as important challenges. Local variation, such as intra-filed CD uniformity or LER, is typically identified from calculated mean CD utilizing top-down view observation. In this study, cross sectional SEM was applied efficiently and resist fundamental behaviors were visualized and quantified. Furthermore, I would mention about minimum structural unit constructing resist pattern related to resolution limit and LER. |
