Ellipsometric studies of low‐temperature metalorganic chemical vapor deposited ZnS thin films
| Autor: | Patricia B. Smith, R. L. Strong |
|---|---|
| Rok vydání: | 1990 |
| Předmět: |
Materials science
business.industry Surfaces and Interfaces Chemical vapor deposition Combustion chemical vapor deposition Condensed Matter Physics Surfaces Coatings and Films Carbon film Optics Ellipsometry Surface roughness Optoelectronics Metalorganic vapour phase epitaxy Thin film business Refractive index |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 8:1544-1548 |
| ISSN: | 1520-8559 0734-2101 |
| DOI: | 10.1116/1.576762 |
| Popis: | The most common techniques used for the determination of thin film thickness are profilometry, spectrophotometry, and ellipsometry. Spectrophotometers require the refractive index of the film (generally assumed to be transparent) as an input parameter. Profilometers yield nonreproducible and often inaccurate film thickness measurements when the films exhibit rough surface structure. Ellipsometric analyses of polycrystalline metalorganic chemical vapor deposition (MOCVD) ZnS films which assume that the thin films are single, uniform, transparent layers do not produce reliable or self‐consistent optical parameters or thickness values for the films. We employed multiple wavelength ellipsometry to analyze thin, polycrystalline MOCVD ZnS films. A two‐layer model incorporating absorption and surface roughness was used to determine the thicknesses of the two layers self‐consistently at wavelengths of 4050, 5461, and 6328 A. The optical constants of the two layers are related through the Bruggeman effective mediu... |
| Databáze: | OpenAIRE |
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