High removal rate of cross-linked SU-8 resist using hydrogen radicals generated by tungsten hot-wire catalyzer
| Autor: | Hideo Horibe, Takashi Nishiyama, Seiji Takahashi, Yu Arai, Akihiko Kono, Masashi Yamamoto, Takeshi Maruoka, Yousuke Goto |
|---|---|
| Rok vydání: | 2014 |
| Předmět: |
Hydrogen radical
Mixed gas Inorganic chemistry Metals and Alloys Substrate (chemistry) chemistry.chemical_element Surfaces and Interfaces Tungsten Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry Resist Environmental chemistry Materials Chemistry Molecule Catalytic decomposition |
| Zdroj: | Thin Solid Films. 562:632-637 |
| ISSN: | 0040-6090 |
| Popis: | This paper discusses the removal of chemically amplified negative-tone i-line resist SU-8 using hydrogen radicals generated by the catalytic decomposition of H2 molecules in H2/N2 mixed gas (H2:N2 = 10:90 vol.%) using a tungsten hot-wire catalyzer. SU-8 resists with exposure doses from 7 to 280 mJ/cm2 were removed by hydrogen radicals, although the SU-8 removal rate was independent of the exposure dose. The SU-8 removal rate increased with both substrate and catalyzer temperature, in addition to a decrease in the distance between the catalyzer and substrate. A high removal rate for cross-linked SU-8 with an exposure dose of 14 mJ/cm2 of approximately 4 μm/min was achieved with a catalyzer to substrate distance of 20 mm, and catalyzer and initial substrate temperatures of 2400 and 165 °C, respectively. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect